Intel overcomes further boundaries. All thanks to High NA EUV
Cooperation between semiconductor industry leaders is strengthening. Intel has completed the installation of a state-of-the-art ASML lithography scanner.
Though Intel is associated mainly with its very efficient processors for personal computers, workstations and servers, Americans also operate in many other fields. We are talking about, among others, graphics systems, AI accelerators and the foundry industry.
This is the first such tool in the industry
As it happens, Intel Foundry announced it has achieved a milestone in advanced semiconductor manufacturing with the completion of assembly of the industry's first commercial lithography scanner High NA EUV From ASMLlocated at the company's research and development center in Oregon (USA).
The tool is currently undergoing calibration stages in preparation for future production of Intel processes. The described machine is able to improve resolution and feature scaling for next-generation processors by changing the design of the optics used to project images onto a silicon wafer.
What does it mean? The Blues are gaining momentum in semiconductor production, which will allow them to compete with giants such as Samsung or TSMC. High NA EUV, also called 0.55NA EUV, will be used to produce test lithography Intel 18A (1.8 nm) in 2025 and thereafter until Intel 14A (1.4nm).
The Americans claim that they see the possibility of using High NA EUV in at least three of their next lithography, and perhaps in later production processes. Meaning that this will be a key element of the Intel Foundry offering in the coming years. Of course, it is worth holding off on final judgments until we see the first layouts. Both the moment at which they are offered and their yield will be crucial.
